\(C_{ox}=\frac{\varepsilon_{0}\varepsilon_{r}A}{d_{ox}}\)
其中\(A(cm^{2})\)为MOS电容的面积,\(d_{ox}(cm)\)为氧化物层的厚度,\(\varepsilon_{0}\varepsilon_{r}(F/cm)\)为氧化物的电容率
\(C_{ox}=\frac{\varepsilon_{0}\varepsilon_{r}A}{d_{ox}}\)
其中\(A(cm^{2})\)为MOS电容的面积,\(d_{ox}(cm)\)为氧化物层的厚度,\(\varepsilon_{0}\varepsilon_{r}(F/cm)\)为氧化物的电容率
status | not learned | measured difficulty | 37% [default] | last interval [days] | |||
---|---|---|---|---|---|---|---|
repetition number in this series | 0 | memorised on | scheduled repetition | ||||
scheduled repetition interval | last repetition or drill |